Sputtering target and production method of the same
AssigneeMitsubishi Materials Corporation
InventorsShoubin Zhang, Keita Umemoto, Masahiro Shoji
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Abstract
A sputtering target consists of a sintered body having a component composition consisting of: Ga of 10 to 40 at. % and Na of 0.1 to 15 at. % as metal elements; and the balance being Cu and inevitable impurities. The sintered body contains the Na in a form of Na compounds consisting of at least one compound selected from the group consisting of sodium sulfate, sodium sulfite, sodium selenate, and sodium selenite, the sintered body has a composition in which a Na compound phase is dispersed, and an average grain size of the Na compound phase is 10 μm or less.
Claims8
A sputtering target consisting of a sintered body having a component composition consisting of:
- Ga of 10 to 40 at. % and Na of 0.1 to 15 at. % as metal elements;
- and
- the balance being Cu and inevitable impurities,
- wherein the sintered body contains the Na in a form of Na compounds consisting of at least one compound selected from the group consisting of sodium sulfate, sodium sulfite, sodium selenate, and sodium selenite,
- the sintered body has a composition in which a Na compound phase is dispersed, and
- an average grain size of the Na compound phase is 10.0 μm or less.
A production method of the sputtering target comprising the steps of:
- preparing a mixed powder in which a Na compound powder and a Cu—Ga powder are mixed, the Na compound powder consisting of at least one compound selected from the group consisting of sodium sulfate, sodium sulfite, sodium selenate, and sodium selenite;
- and
- producing a sintered body by sintering the mixed powder,
- wherein the Cu—Ga powder consists of a Cu—Ga alloy powder or consists of a Cu—Ga alloy powder and a Cu powder,
- the average particle size thereof is 1 to 45 μm, and
- the particle having the particle size of 30 μm or less is account for 50 wt. % or more compared to the total powder weight of the Cu—Ga powder.
Dependencies are inferred from the claim text.