Uniformity Control using Adjustable Internal Antennas
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAlexandre Likhanskii, Svetlana B. Radovanov
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AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAlexandre Likhanskii, Svetlana B. Radovanov
Estimating the term…
A plasma chamber having improved plasma density is disclosed. The plasma chamber utilizes internal antennas. These internal antennas can be manipulated in a variety of ways to control the uniformity of the plasma density. In some embodiments, the conductive coil within the antenna is translated from a first location to a second location. For example, the entirety of the internal antennas may be translated within the plasma chamber. In another embodiment, the conductive coil disposed within the outer tube is translated relative to its outer tube. In another embodiment, the conductive coil within the outer tube may be bent and may be rotated within the outer tube. In another embodiment, the outer tube may also be bent and rotated. In other embodiments, ferromagnetic segments may be disposed in the outer tube to focus or block the electromagnetic energy emitted from the conductive coil.
A plasma chamber, comprising:
A plasma chamber, comprising:
A plasma chamber, comprising:
Dependencies are inferred from the claim text.