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US 2016/0079034 A1Published application
Flowable film properties tuning using implantation
AssigneeApplied Materials, Inc.
InventorsEllie Y. Yieh, Ludovic Godet, Jun Xue, Srinivas D. Nemani, DongQing (Karen) Li, Erica Chen
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Abstract
Species are supplied to a flowable layer over a substrate. A property of the flowable layer is modified by implanting the species to the flowable layer. The property comprises a density, a stress, a film shrinkage, an etch selectivity, or any combination thereof.
Claims20
A method to manufacture an electronic device comprising:
- supplying species to a flowable layer over a substrate;
- and
- adjusting a property of the flowable layer by implanting the species to the flowable layer, wherein the property comprises a density, a stress, a film shrinkage, an etch selectivity, or any combination thereof.
A method to manufacture an electronic device comprising:
- depositing a flowable layer over a plurality of features over a substrate;
- implanting species to the flowable layer over the plurality of features to adjust etch selectivity of at least one of the flowable layer and the plurality of features.
An apparatus to manufacture an electronic device comprising:
- a processing chamber comprising a pedestal to hold a workpiece comprising a flowable layer over a substrate;
- an ion source coupled to the processing chamber and an electromagnet system to supply species to the flowable layer;
- a processor coupled to the ion source, wherein the processor has a first configuration to adjust a property of the flowable layer by controlling of implanting the species to the flowable layer, wherein the property comprises a density, a stress, a film shrinkage, an etch selectivity, or any combination thereof.
Dependencies are inferred from the claim text.