Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes

Method of generating data relative to the writing of a pattern by electronic radiation, successively comprises:

• S1) providing a pattern to be formed on a substrate,
• S2) forming a work pattern from the pattern to be formed, the work pattern comprising a single external envelope,
• S3) breaking down the work pattern into a set of elementary outlines comprising a plurality of elementary outlines each having a single external envelope, and defining a set of insolation conditions for each elementary outlines,
• S4) comparing the pattern to be formed with a simulation pattern representing the sets of insolation conditions for the elementary outlines to discriminate a simulation pattern representative of the pattern to be formed from a simulation pattern which is not representative of the pattern to be formed,
• wherein, if the simulation pattern is not representative of the pattern to be formed, the method comprises:
• S7) determining at least one shift vector between at least a portion of the external envelope of the pattern to be formed and a corresponding portion of the external envelope of the simulation pattern,
• S8) displaying at least a portion of the external envelope of the work pattern or of the pattern to be formed according to a displacement vector determined at least from the corresponding shift vector to form a new work pattern,
• carrying out a new iteration of steps S3) and S4).