Operating method of nand flash memory unit
AssigneePhison Electronics Corp.
InventorsWei Lin, Yu-Cheng Hsu, Kuo-Yi Cheng
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AssigneePhison Electronics Corp.
InventorsWei Lin, Yu-Cheng Hsu, Kuo-Yi Cheng
Estimating the term…
A NAND flash memory unit, an operating method and a reading method are provided. The NAND flash memory unit includes a plurality of gate layers, a tunnel layer, a charge trapping layer, a conductor layer and a second dielectric layer. A first dielectric layer is included between two adjacent gate layers among the gate layers. The tunnel layer, the charge trapping layer, the conductor layer, and the second dielectric layer penetrate the gate layers. The charge trapping layer is disposed between the tunnel layer and the gate layers, and the second dielectric layer is disposed between the conductor layer and the tunnel layer. Therefore, an erasing speed may be increased; the charge trapping layer may be repaired; the controllability of the gate layers may be increased.
An operating method of a NAND flash memory unit, wherein the NAND flash memory unit comprises a plurality of gate layers, a conductive structure, and a charge trapping layer, wherein the conductive structure and the charge trapping layer penetrate the gate layers, wherein the charge trapping layer is disposed between the conductive structure and the gate layers, and wherein the operating method comprises:
Dependencies are inferred from the claim text.