Photolithography systems and associated methods of overlay error correction
AssigneeMicron Technology, Inc.
InventorWoong Jae Chung
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Abstract
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography system includes measuring a plurality of first overlay errors that individually correspond to a microelectronic substrate in a first batch of microelectronic substrates. The method also includes determining a relationship between the first overlay errors and a first sequence of the microelectronic substrates in the first batch. The method further includes correcting a second overlay error of individual microelectronic substrates in a second batch based on a second sequence of the microelectronic substrates in the second batch and the determined relationship.
Claims3
A computer-readable medium containing a data structure, the data structure including:
- a sequence number of a microelectronic substrate in a set of microelectronic substrates;
- and
- a mathematical model of at least one of an X-translation, a Y-translation, a substrate rotation, a substrate orthogonality, a field magnification, an asymmetrical magnification, a field rotation, a field asymmetrical rotation, a substrate expansion along the X-axis, and a substrate expansion along the Y-axis of the individual microelectronic substrates with respect to the sequence number.
Dependencies are inferred from the claim text.