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US 2016/0077508 A1Published application
Controller for treatment of semiconductor processing equipment effluent
AssigneeApplied Materials, Inc.
InventorRonald Vern SCHAUER
Life of this patent
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Abstract
Embodiments disclosed herein include a controller for a treatment system for lessening the hazard of effluents produced in a processing system.
Claims20
A controller, comprising:
- a MCU for processing a program;
- a plurality of I/O ports configured to communicate with the MCU;
- an interlock logic in communication with the MCU, wherein the interlock logic provides a run state for the MCU;
- memory, where the memory comprises:
- recipe memory storing a plurality of programs;
- and
- log memory;
- and
- wherein the MCU is configured to execute a selected one of the plurality of programs upon the interlock logic providing a run state.
6 more elements
A method for treating effluent from a plasma processing chamber with a controller, the method comprising:
- determining if necessary interlocks and conditions for running the selected program are met;
- and
- if the necessary interlocks and conditions for running the selected program are met, treating effluent from a plasma processing chamber using the select program using a plasma source of a pre-treatment system interfaced with an exhaust port of the plasma processing chamber.
Dependencies are inferred from the claim text.