US 2016/0070165 A1 · REAGENT AND COMPOSITION OF RESIST

Abstract

Described is a reagent that enhances acid generation of a photoacid generator and a composition containing such reagent.

Dependent claims

A reagent wherein:

a feed of an energy to the reagent or to an acceptor for the reagent receiving the energy generates an intermediate from the reagent;
and further wherein
the intermediate enhances generation of acid from a precursor, wherein the intermediate is a ketyl radical.

Dependencies are inferred from the claim text.

Facts

Application

14/891,293Filed 13 May 2014

Priority

13 May 2013

Published

10 Mar 2016

Term ends

Not estimatedThe source records don’t support an estimate.

G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
C07C 33/24
Monohydroxylic alcohols containing only six-membered aromatic rings as cyclic part: polycyclic without condensed ring systems
C07C 35/38
With a hydroxy group on a condensed system having three rings: derived from the fluorene skeleton
C07C 35/40
With a hydroxy group on a condensed system having three rings: derived from the anthracene skeleton

Described is a reagent that enhances acid generation of a photoacid generator and a composition containing such reagent.

Dependent claims

A reagent wherein:

a feed of an energy to the reagent or to an acceptor for the reagent receiving the energy generates an intermediate from the reagent;
and further wherein
the intermediate enhances generation of acid from a precursor, wherein the intermediate is a ketyl radical.

Dependencies are inferred from the claim text.