Method of forming a magnetic domain wall in a nanowire
AssigneeNanyang Technological University
InventorsChinkhanlun GUITE, Inn Seng KERK, Chandra Sekhar MURAPAKA, Wen Siang LEW
Life of this patent
Estimating the term…
Loading patent…
AssigneeNanyang Technological University
InventorsChinkhanlun GUITE, Inn Seng KERK, Chandra Sekhar MURAPAKA, Wen Siang LEW
Estimating the term…
A method of forming a domain wall in a nanowire, the method comprising the steps of: a) providing a conductive strip orthogonally to a nanowire adjacent a free end of the nanowire, the nanowire having an original magnetization direction; b) pulsing a current through the conductive strip to generate an Oersted field having a direction opposite to the original magnetization direction such that magnetization direction of a portion of the nanowire transversed by the conductive strip becomes opposite to the original magnetization direction, the domain wall being generated in the nanowire at a location defined between the portion of the nanowire transversed by the conductive strip and a second end of the nanowire, wherein no external magnetic field is provided during formation of the domain wall.
A method of forming a domain wall in a nanowire, the method comprising the steps of:
Dependencies are inferred from the claim text.