Method of forming oriented block copolymer line patterns, block copolymer line patterns formed thereby, and their use to form patterned articles
AssigneesUniversity of Massachusetts, Unist Academy-Industry Research Corporation, The Regents of the University of California
InventorsThomas P. Russell, Sung Woo Hong, Dong Hyun Lee, Soojin Park, Ting Xu
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Abstract
A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
Claims20
A structured article comprising:
- a substrate comprising a surface comprising parallel facets characterized by a pitch, λ, having units of nanometers and corresponding to the separation between adjacent facets;
- and
- an annealed block copolymer film comprising a surface contacting the substrate surface comprising parallel facets;
- wherein the annealed block copolymer film comprises linear microdomains parallel to the substrate surface and orthogonal to the parallel facets;
- wherein the block copolymer in bulk comprises a hexagonal array of cylindrical microdomains characterized by a center-to-center spacing, L2, of adjacent cylindrical microdomains, wherein L2 has units of nanometers;
- wherein λ/L2 is either less than or equal to 0.73 or greater than or equal to 1.4;
- and
- wherein the structured article is prepared by a method comprising
- forming a block copolymer film on the substrate surface comprising parallel facets;
- and
- annealing the block copolymer film to form the annealed block copolymer film.
A structured article, comprising:
- a substrate comprising a surface comprising parallel facets characterized by a pitch, λ, having units of nanometers and corresponding to the separation between adjacent facets;
- and
- a block copolymer film comprising a surface contacting the substrate surface comprising parallel facets;
- wherein the block copolymer film comprises linear microdomains parallel to the substrate surface and orthogonal to the parallel facets;
- wherein the block copolymer in bulk comprises a hexagonal array of cylindrical microdomains characterized by a center-to-center spacing, L2, of adjacent cylindrical microdomains, wherein L2 has units of nanometers;
- and
- wherein λ/L2 is either less than or equal to 0.73 or greater than or equal to 1.4.
Dependencies are inferred from the claim text.