# US 2015/0371834 A1 · Apparatus and Methods for Defining a Plasma > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2015/0371834 A1 - Document ID: US20150371834A1 - Status: Published application - Kind: A1 - Application number: 14/764,622 - Filed: 2014-01-24 - Published: 2015-12-24 - Earliest claimed: 2013-02-01 - Assignees: CAMVAC Limited - Applicants: Camvac Limited - Inventors: David Anthony; John Topping - Web page: https://patentgrep.com/patent/US20150371834A1 ## CPC - H01J 37/32669: {Particular magnets or magnet arrangements for controlling the discharge} - H01J 37/32036: {AC powered} - H01J 37/32422: {Arrangement for selecting ions or species in the plasma} - H01J 37/32715: {Workpiece holder} - H01J 37/32752: {for moving the material across the discharge} - H01J 37/3277: {of continuous material} - B05D 1/62: {Plasma-deposition of organic layers (plasma deposition in general C23C14/00, C23C16/00)} - B05D 2252/02: of indefinite length - H01J 2237/3382: Polymerising - Y02P 20/582: Recycling of unreacted starting or intermediate materials - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02) - Y02P: CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS ## Abstract Apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; and an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux. The ion flux has an energy level between 3.6 eV and 250 eV. Alternatively, apparatus for defining plasma having a plurality of spaced race track portions. ## Claims ### Claim 1 An apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux, wherein the ion flux has an energy level between 3.6 eV and 250 eV. ### Claim 2 (depends on 1) The apparatus of claim 1, further comprising a delivery device arranged to deliver radiation curable material to the substrate, the apparatus being arranged such that the radiation curable material condenses on the substrate. ### Claim 3 (depends on 1) The apparatus of claim 1, further comprising a magnet array arranged to spatially define the plasma. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the electrode and plasma generator are arranged to provide a unit energy dose which is no greater than 15 J/cm2. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the support is arranged to move the substrate at a speed through the ion flux such that the dwell time is no greater than 5 minutes. ### Claim 6 (depends on 1) The apparatus of claim 1, further comprising a gas delivery system arranged to deliver a primary gas from which the plasma is generated and one or more further gases that are distinct from the primary gas. ### Claim 7 A method comprising: providing a moving substrate; generating a plasma; and biasing ions within the plasma towards the moving substrate to form an ion flux, the ion flux having an energy level between 3.6 eV and 250 eV. ### Claim 8 (depends on 7) The method of claim 7, further comprising condensing a radiation curable material on the substrate and curing the radiation curable material with the ion flux. ### Claim 9 (depends on 7) The method of claim 7, whereby the substrate is moving at a line speed of at least 50 m/min. ### Claim 10 (depends on 8) The method of claim 8, whereby the condensed radiation curable material has a thickness in the range 0.001 μm to 50 μm. ### Claim 11 (depends on 7) The method of claim 7, whereby an unit energy dose to the substrate is no greater than 15 J/cm2. ### Claim 12 (depends on 7) The method of claim 7, whereby the generating step comprises providing a plasma gas and exciting the plasma gas to form a gas plasma and optionally providing a further gas that is distinct from the plasma gas. ### Claim 13 (depends on 7) The method of claim 7, whereby the ion flux is biased from the plasma with a driving voltage that is positive relative to the substrate. ### Claim 14 (depends on 7) The method of claim 7, whereby the plasma is spatially defined by a magnet array. ### Claim 15 (depends on 7) The method of claim 7, whereby a dwell time for the ion flux being exposed to the substrate is no greater than 5 minutes. ### Claim 16 An apparatus comprising: a drum arranged to transport a moving substrate; a plasma generator arranged to generate a plasma; and a magnet array arranged to define a magnetic field configured to influence the generated plasma to form: a first race track portion that is adjacent to a first surface region of the drum; and a second race track portion that is adjacent to a second surface region of the drum, wherein the first and second surface regions are circumferentially spaced from one another. ### Claim 17 (depends on 16) The apparatus of claim 16, wherein the first and second surface regions are circumferentially spaced from one another by at least 20 mm. ### Claim 18 (depends on 16) The apparatus of claim 16, wherein the magnet array comprises a first magnet assembly arranged to define the first race track portion and a second magnet assembly arranged to define the second race track portion. ### Claim 19 (depends on 16) The apparatus of claim 16, wherein the magnet array comprises a first magnet assembly arranged to define a race track comprising the first and second race track portions. ### Claim 20 (depends on 16) The apparatus of claim 16, wherein the magnet array is arranged to define one or more further race track portions, each race track portion being adjacent to the surface of the drum and circumferentially spaced from each other race track portion by at least 20 mm. ### Claim 21 (depends on 16) The apparatus of claim 16, wherein the magnet array is disposed within the drum and the drum defines an electrode arranged to generate the plasma. ### Claim 22 (canceled) ### Claim 23 (depends on 16) The apparatus of claim 16, further comprising an electrode arranged to bias ions within the plasma towards the drum to form an ion flux, wherein the ion flux has an energy level between 3.6 eV and 250 eV and the magnet array is arranged to define the first race track portion on a first side of the substrate and the second race track portion on the opposite side of the substrate. ### Claim 24 (canceled) ### Claim 25 (depends on 16) The apparatus of claim 16, further comprising a gas delivery system and a delivery device, the delivery system arranged to deliver a primary gas from which the plasma is generated and one or more further gases that are distinct from the primary gas, the delivery device arranged to deliver radiation curable material to the substrate, the apparatus being arranged such that the radiation curable material condenses on the substrate. ### Claim at position 26 26-28. (canceled)