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AssigneeNorth Carolina State University
InventorsMichael J. Escuti, Matthew N. Miskiewicz, Jihwan Kim
Estimating the term…
A direct-write lithography apparatus includes a polarization selector stage configured to vary a polarization orientation angle of light from a light source, a focusing element configured to focus the light from the light source into a spot at a focal plane thereof, and a scanning stage configured to scan the spot in at least two dimensions along a surface of a polarization-sensitive recording medium that is arranged proximate to the focal plane such that neighboring scans substantially overlap. The polarization selector stage and the scanning stage are configured to be operated independently of one another. Related fabrication methods of and optical elements fabricated thereby are also discussed.
An apparatus, comprising:
-7. (canceled)
The method of claim 22, wherein a polarization selector stage is arranged between the light source and a focusing element.
(canceled)
The method of claim 23, wherein a scanning stage is arranged between a focusing element and the focal plane thereof, and wherein a polarization selector stage is arranged between the scanning stage and the focal plane of the focusing element.
-15. (canceled)
A direct-write lithography method, comprising:
An optical element, comprising:
Dependencies are inferred from the claim text.