Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof

Abstract

A thin film transistor and manufacturing method thereof, an array substrate (1) comprising the thin film transistor and manufacturing method thereof. The method of manufacturing the thin film transistor comprises forming an active layer (4) and a source-drain electrode layer (5), forming a photoresist layer (6) on the source-drain electrode layer (5) and forming a pattern of the photoresist layer by a pattern process; etching the source-drain electrode layer (5) by using the pattern of the photoresist layer as a mask to form a pattern of the source-drain electrode layer including a source electrode and a drain electrode; and removing the photoresist, then etching the active layer (4) by using the pattern of the source-drain electrode layer as a mask to form a pattern of the active layer. The method of manufacturing the thin film transistor and the array substrate can prevent or decrease the possibility of the region of the active layer between the source electrode and the drain electrode in the thin film transistor being polluted by organics, thereby improve the electrical performance of the thin film transistor.

Dependencies are inferred from the claim text.