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AssigneesBoe Technology Group Co., Ltd., Beijing Boe Optoelectronics Technology Co., Ltd.
InventorsWenyu ZHANG, Zhenyu XIE, Jian GUO
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Embodiments of the invention disclose an array substrate and a method for manufacturing the same, and a display device. The method for manufacturing an array substrate comprising: forming a gate metal layer, wherein the gate metal layer comprises gate lines; film-forming an active layer and film-forming a signal line metal layer, wherein the signal line metal layer comprises data lines; and forming both a pattern of the active layer and a pattern of the signal line metal layer simultaneously using a half-tone mask process, wherein after film-forming the active layer and before film-forming the signal line metal layer, the method further comprising: hollowing out a first region of the active layer through a patterning process, wherein the first region is below the data lines in a display area, and the first region excludes portions of the active layer corresponding to overlapping regions of the data lines and the gate lines.
A method for manufacturing an array substrate comprising:
An array substrate comprising thin film transistors, and data lines and gate lines provided crossly, a pattern of a layer where the data lines are located and a pattern of an active layer of the thin film transistors are formed simultaneously by using a half-tone mask process, wherein
Dependencies are inferred from the claim text.