Low temperature polycrystalline silicon backplane with coated aperture edges
AssigneePixtronix, Inc.
InventorKatsumi Matsumoto
Life of this patent
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Abstract
This disclosure provides systems, methods, and apparatus for forming a display apparatus. In some implementations, a conductive material used for the formation of terminal contacts of a transistor can be also used to form a light absorbing coating over sidewalls of a plurality of apertures formed in an aperture layer of a display apparatus. In some implementations, the conductive material can be patterned such that the display apparatus also includes front facing light absorbing coating over the aperture layer. In some implementations, the front facing light absorbing coating can be electrically connected to a shutter assembly formed over the aperture layer.
Claims18
An apparatus, comprising:
- a transparent substrate;
- an aperture layer having a plurality of apertures, each of the plurality of apertures having a light absorbing conductive coating covering their respective sidewalls of each of the plurality of apertures;
- and
- a thin film transistor disposed over the aperture layer, the transistor having a semiconductor channel disposed over the aperture layer, a source metal contact, and a drain metal contact, the source and drain metal contacts being formed concurrently with, and of the same material as, the light absorbing conductive coating formed on the sidewalls of each of the plurality of apertures.
A method for forming a display apparatus, comprising:
- forming a plurality of openings in a reflective layer deposited on a transparent substrate;
- forming a semiconductor channel of a thin film transistor over the reflective layer;
- and
- depositing and patterning a light absorbing conductive layer to form source and drain contacts of the transistor and to concurrently form light absorbing coatings covering sidewalls of each of the plurality of openings.
Dependencies are inferred from the claim text.