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US 2015/0318243 A1Published application
Composite Contact Plug Structure and Method of Making Same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Hung Lin, Sheng-Hsuan Lin, Chih-Wei Chang, You-Hua Chou, Chia-Lin Hsu
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Abstract
An embodiment contact plug includes a bilayer structure and a diffusion barrier layer on a sidewall and a bottom surface of the bilayer structure. The bilayer structure includes a conductive core and a conductive liner on a sidewall and a bottom surface of the conductive core. In the embodiment contact plug, the conductive liner comprises cobalt or ruthenium.
Claims20
A contact plug comprising:
- a bilayer structure comprising:
- a conductive core;
- and
- a conductive liner on a sidewall and a bottom surface of the conductive core, wherein the conductive liner comprises cobalt or ruthenium;
- and
- a diffusion barrier layer on a sidewall and a bottom surface of the bilayer structure.
3 more elements
A semiconductor device comprising:
- a dielectric layer;
- a contact plug extending through the dielectric layer, wherein the contact plug comprises:
- a conductive core;
- a conductive liner on sidewalls and a bottom surface of the conductive core, wherein the conductive liner comprises cobalt or ruthenium;
- and
- a diffusion barrier layer on sidewalls and a bottom surface of the conductive liner, wherein the conductive liner is disposed between the diffusion barrier layer and the conductive core;
- and
- a silicide region under the dielectric layer, wherein the contact plug contacts the silicide region.
5 more elements
A method for forming a contact plug comprising:
- forming a dielectric layer over a substrate;
- patterning an opening in the dielectric layer exposing the substrate;
- forming a diffusion barrier layer in the opening;
- forming a conductive liner on sidewalls and a bottom surface of the diffusion barrier layer, wherein the conductive liner comprises cobalt or ruthenium;
- and
- forming a conductive core in the opening, wherein the conductive core and the conductive liner comprise a different conductive materials, and wherein the conductive liner is disposed between the conductive core and the diffusion barrier layer.
3 more elements
Dependencies are inferred from the claim text.