Middle of line structures and methods for fabrication
AssigneeInternational Business Machines Corporation
InventorsQINGHUANG LIN, YING ZHANG
Life of this patent
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Abstract
A contact structure includes a permanent antireflection coating formed on a substrate having contact pads. A patterned dielectric layer is formed on the antireflective coating. The patterned dielectric layer and the permanent antireflective coating form openings. The openings correspond with locations of the contact pads. Contact structures are formed in the openings to make electrical contact with the contacts pads such that the patterned dielectric layer and the permanent antireflective coating each have a conductively filled region forming the contact structures.
Claims8
A method for fabricating a contact, comprising:
- forming a permanent antireflective coating on a substrate;
- forming a pattern of resist islands in a first resist directly on the permanent antireflective coating, the resist islands occupying volumes where contacts will be formed;
- filling spaces between the resist islands with an interlevel dielectric composition;
- removing the resist islands to form contact holes in the interlevel dielectric composition;
- opening up the antireflection coating to expose contact pads within the contacts holes;
- and
- filling the contacts holes with an electrically conductive fill material to form contacts.
Dependencies are inferred from the claim text.