Film forming method
AssigneesTokyo Electron Limited, Iwatani Corporation
InventorsKazuo YABE, Akira SHIMIZU, Koichi IZUMI, Masahiro FURUTANI
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AssigneesTokyo Electron Limited, Iwatani Corporation
InventorsKazuo YABE, Akira SHIMIZU, Koichi IZUMI, Masahiro FURUTANI
Estimating the term…
A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere includes performing a cycle a plurality of times. The cycle includes: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide.
A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere, the method comprising performing a cycle a plurality of times, the cycle including:
Dependencies are inferred from the claim text.