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US 2015/0318152 A1Published application
Sputtering targets and methods
AssigneeBh5773 Ltd
InventorGennady YUMSHTYK
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Abstract
Multi-component sputtering target structures suitable for deposition of metallic alloy films are provided. The multi-component target may be formed by winding wires of different materials around a target support structure to form a dense winding. The sputtering target structures and methods of the invention can be used to produce a variety of refractory metal alloy films.
Claims18
A sputtering target structure comprising
- a) a tubular target support;
- and
- b) a multi-component target at least partially covering the outer surface of the target support, the multi-component target comprising
- i) a first component of a first material, the first component being coiled around the target support;
- ii) a second component of a second material, the second component being coiled around the target support;
- wherein the coils of the first and the second component are interlocking and are in contact with each other and the target support.
3 more elements
Dependencies are inferred from the claim text.