US 2015/0318151 A1Published application

Plasma source

AssigneeOberlikon Surface Solutions AG, PfäFfikon

InventorsSiegfried Krassnitzer, Juerg Hagmann

Life of this patent

Estimating the term…

Loading patent…

Abstract

A plasma generating device includes a plasma source having a plasma source hollow body (1) and an electron emission unit (5) for emitting free electrons into the plasma source hollow body. The plasma source hollow body (1) has a first gas inlet (7a) and a plasma source opening (10) which forms an opening to a vacuum chamber. An anode has an anode hollow body (2). The anode hollow body (2) has a second gas inlet (7b) and an anode opening (11) which forms an opening to the vacuum chamber, and a voltage source (8) the negative pole of which is connected to the electron emission unit (5) and the positive pole of which is connected to the anode hollow body (2). The positive pole of the voltage source (8) is electrically connected by a first shunt (6a) to the plasma source hollow body.

Claims6

Dependent claims

A plasma generating device, comprising:

a plasma source having a plasma source hollow body (1) and an electron emission unit (5) which allows to emit free electrons into the plasma source hollow body, wherein the plasma source hollow body (1) comprises a first gas inlet (7a) and a plasma source opening (10) which forms an opening to a vacuum chamber,
an anode comprising an anode hollow body (2), wherein the anode hollow body (2) comprises a second gas inlet (7b) and an anode opening (11) which forms an opening to the vacuum chamber, and
a voltage source (8) the negative pole of which is connected to the electron emission unit (5) and the positive pole of which is connected to the anode hollow body (2),
characterized in that the positive pole of the voltage source (8) is additionally electrically connected to the plasma source hollow body by means of a first shunt (6a).

1 more element

Dependencies are inferred from the claim text.