Lithography apparatus, and method of manufacturing an article
AssigneeCanon Kabushiki Kaisha
InventorsDaisuke Iwase, Nobushige Korenaga
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Abstract
The present invention provides a lithography apparatus that forms a pattern on a substrate, the apparatus comprising a base, a stage configured to hold the substrate and be movable above the base with the stage supported by the base, a patterning device configured to perform patterning on the substrate held by the stage, a chamber housing the base and the stage, and supporting the patterning device, a detector configured to obtain information of relative positions between the patterning device and the base, a driving device configured to move the base, and a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.
Claims12
A lithography apparatus that forms a pattern on a substrate, the apparatus comprising:
- a base;
- a stage configured to hold the substrate and be movable above the base with the stage supported by the base;
- a patterning device configured to perform patterning on the substrate held by the stage;
- a chamber housing the base and the stage, and supporting the patterning device;
- a detector configured to obtain information of relative positions between the patterning device and the base;
- a driving device configured to move the base;
- and
- a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.
A method of manufacturing an article, the method comprising steps of:
- forming a pattern on a substrate using a lithography apparatus;
- and
- processing the substrate, on which the pattern has been formed, to manufacture the article,
- wherein the lithography apparatus forms the pattern on the substrate, and includes:
- a base;
- a stage configured to hold the substrate and be movable above the base with the stage supported by the base;
- a patterning device configured to perform patterning on the substrate held by the stage;
- a chamber housing the base and the stage, and supporting the patterning device;
- a detector configured to obtain information of relative positions between the patterning device and the base;
- a driving device configured to move the base;
- and
- a controller configured to control the driving device based on the information obtained by the detector such that the relative positions satisfy a predetermined condition.
Dependencies are inferred from the claim text.