Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsBob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS
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Abstract
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
Claims20
A lithographic projection apparatus comprising:
- a projection system arranged to project a patterned beam of radiation onto the substrate;
- a liquid supply system configured to supply liquid to a space between the projection system and the substrate;
- and
- a liquid detector configured to detect liquid remaining on the substrate and/or a movable table after an exposure is completed.
A device manufacturing method comprising projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate and, after the projecting is complete, detecting residual liquid on the substrate and/or a movable table of the lithographic apparatus.
Dependencies are inferred from the claim text.