Plasma dry strip pretreatment to enhance ion implanted resist removal
AssigneeLam Research Corporation
InventorsIvan L. Berry, III, Glen Gilchrist
Life of this patent
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Abstract
Systems and methods for processing a substrate include exposing a substrate to UV light from a UV light source having a predetermined wavelength range. The substrate includes a photoresist layer that has been bombarded with ions. The method includes controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature. The method includes removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature after exposing the substrate to the UV light.
Claims20
A method for processing a substrate, comprising:
- exposing a substrate to UV light from a UV light source having a predetermined wavelength range, wherein the substrate includes a photoresist layer that has been bombarded with ions;
- controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature;
- and
- after exposing the substrate to the UV light, removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature.
A substrate processing system to process a substrate, comprising:
- a first processing station including:
- a UV light source to expose a substrate to UV light having a predetermined wavelength range, wherein the substrate includes a photoresist layer that has been bombarded with ions;
- and
- a first substrate support to support the substrate and to control a temperature of a substrate, during exposure to the UV light, to a temperature less than or equal to a first temperature;
- and
- a second processing station including:
- a second substrate support to support the substrate and to control a temperature of the substrate to a strip process temperature during photoresist stripping;
- a process gas supply to supply process gases to the processing station during the photoresist stripping;
- and
- a plasma generator to generate plasma in the processing station during the photoresist stripping.
Dependencies are inferred from the claim text.