Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorKatsumi Asada
Life of this patent
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Abstract
The present invention provides an optical apparatus that deforms a reflecting surface of a mirror, comprising a base plate, a plurality of actuators that are disposed between the base plate and the mirror and are configured to apply a force to the mirror, a detection unit configured to detect vibration generated in the base plate, and a control unit configured to control each actuator based on a result of detection performed by the detection unit such that a deformation of the mirror caused as a result of the vibration generated in the base plate is within an acceptable range.
Claims14
An optical apparatus that deforms a reflecting surface of a mirror, the optical apparatus comprising:
- a base plate;
- a plurality of actuators that are disposed between the base plate and the mirror and are configured to apply a force to the mirror;
- a detection unit configured to detect vibration generated in the base plate;
- and
- a control unit configured to control each actuator based on a result of detection performed by the detection unit such that a deformation of the mirror caused as a result of the vibration generated in the base plate is within an acceptable range.
A projection optical system that projects a mask pattern onto a substrate, the projection optical system comprising an optical apparatus that deforms a reflecting surface of a mirror,
- wherein the optical apparatus includes:
- a base plate;
- a plurality of actuators that are disposed between the base plate and the mirror and are configured to apply a force to the mirror;
- a detection unit configured to detect vibration generated in the base plate;
- and
- a control unit configured to control each actuator based on a result of detection performed by the detection unit such that a deformation of the mirror caused as a result of the vibration generated in the base plate is within an acceptable range.
An exposure apparatus that exposes a substrate with light, the exposure apparatus comprising a projection optical system that includes an optical apparatus and projects a mask pattern onto a substrate,
- wherein the optical apparatus that deforms a reflecting surface of a mirror, and includes:
- a base plate;
- a plurality of actuators that are disposed between the base plate and the mirror and are configured to apply a force to the mirror;
- a detection unit configured to detect vibration generated in the base plate;
- and
- a control unit configured to control each actuator based on a result of detection performed by the detection unit such that a deformation of the mirror caused as a result of the vibration generated in the base plate is within an acceptable range.
A method of manufacturing an article, the method comprising steps of:
- exposing a substrate using an exposure apparatus;
- developing the exposed substrate;
- and
- processing the developed substrate to manufacture the article,
- wherein the exposure apparatus exposes the substrate and includes a projection optical system, which projects a mask pattern onto the substrate and includes an optical apparatus,
- wherein the optical apparatus deforms a reflecting surface of a mirror, and includes:
- a base plate;
- a plurality of actuators that are disposed between the base plate and the mirror and are configured to apply a force to the mirror;
- a detection unit configured to detect vibration generated in the base plate;
- and
- a control unit configured to control each actuator based on a result of detection performed by the detection unit such that a deformation of the mirror caused as a result of the vibration generated in the base plate is within an acceptable range.
Dependencies are inferred from the claim text.