Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin

A resist underlayer film-forming composition for lithography comprising a polymer having a unit structure of Formula (1):

• (wherein A is a hydroxy group-substituted C6-40 arylene group derived from a polyhydroxy aromatic compound;
• B is a C6-40 arylene group or a C4-30 heterocyclic group containing a nitrogen atom, an oxygen atom, a sulfur atom, or a combination thereof;
• X+ is H+, NH4+, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, or a quaternary ammonium ion, T is a hydrogen atom, a C1-10 alkyl group or a C6-40 aryl group that may be substituted with a halogen group, a hydroxy group, a nitro group, an amino group, a carboxylate ester group, a nitrile group, or a combination thereof as a substituent, or a C4-30 heterocyclic group containing a nitrogen atom, an oxygen atom, a sulfur atom, or a combination thereof, B and T may form a C4-40 ring together with a carbon atom to which they are bonded, and n1 is an integer of 1 to the number of group(s) capable of being substituted with hydrogen atom(s) in the group defined by B or hydrogen atom(s) in the ring formed by bonding B and T.).