Resist underlayer film forming composition containing silicon having ester group
AssigneeNissan Chemical Industries, Ltd.
InventorsYuta KANNO, Makoto NAKAJIMA, Satoshi TAKEDA, Hiroyuki WAKAYAMA
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AssigneeNissan Chemical Industries, Ltd.
InventorsYuta KANNO, Makoto NAKAJIMA, Satoshi TAKEDA, Hiroyuki WAKAYAMA
Estimating the term…
A resist underlayer film forming composition for lithography for a resist underlayer film usable as a hardmask. A resist underlayer film forming composition for lithography, including: as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1) or a hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2), and a content of the hydrolyzable silane of Formula (1) or the hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2) in all silanes is less than 50% by mole, R1aR2bSi(R3)4−(a+b) Formula (1) R4a1R5b1Si(R6)4−(a1+b1) Formula (2)
A resist underlayer film forming composition for lithography, comprising:
Dependencies are inferred from the claim text.