Homoadamantane derivative, method for producing the same and photosensitive materials for photoresist
AssigneeOsaka Organic Chemical Industry Ltd.
InventorsShinji TANAKA, Yoshitaka Uenoyama, Hidetoshi Ono, Naoya Kawano, Katsuki Ito
Life of this patent
Estimating the term…
Abstract
A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula wherein R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms; R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group; and n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0. Also, a positive photoresist composition including the (meth)acrylic polymer and a method of forming a photoresist pattern with the positive photoresist composition.
Claims10
(canceled)
A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula (II):
- wherein:
- R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms;
- R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group;
- and
- n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0.
Dependencies are inferred from the claim text.