Photosensitive resin material and resin film
AssigneeSumitomo Bakelite Co., Ltd.
InventorYuma TANAKA
Life of this patent
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Abstract
A photosensitive resin material of the invention is a photosensitive resin material used to form a permanent film including one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A) and a photosensitive diazoquinone compound as a photosensitizing agent (B), in which a content of iron with respect to all non-volatile components, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and non-ionic iron is included as the iron.
Claims6
A photosensitive resin material used to form a permanent film, comprising:
- one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A);
- and
- a photosensitive diazoquinone compound as a photosensitizing agent (B),
- wherein a content of iron with respect to all non-volatile components, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and
- non-ionic iron is included as the iron.
A resin film which constitutes a permanent film and is obtained by curing a photosensitive resin material including one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A) and a photosensitive diazoquinone compound as a photosensitizing agent (B),
- wherein a content of iron, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and non-ionic iron is included as the iron.
Dependencies are inferred from the claim text.