US 2015/0316843 A1Published application

Color filter and method of making the same

AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.

InventorXiangyang Xu

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Abstract

A color filter and a method of making the same are disclosed. The method for fabricating a color filter has the steps of: providing a substrate; forming a black matrix layer on the substrate; using a mask to form at least one first light-filtering pattern on the substrate provided with the black matrix layer; using the mask to form at least one second light-filtering pattern on the substrate provided with the black matrix layer and the first light-filtering pattern; using the mask to form at least one third light-filtering pattern on the substrate provided with the black matrix layer, the first light-filtering pattern and the second light-filtering pattern, wherein the mask has different transmission spectra corresponding to the first light-filtering pattern, the second light-filtering pattern and the third light-filtering pattern, respectively.

Claims19

Dependent claims

A method for fabricating a color filter, comprising the steps of:

providing a substrate;
forming a black matrix layer on the substrate;
coating a first photoresist material on the substrate provided with the black matrix layer, and forming at least one first light-filtering pattern through the mask by ultraviolet exposure and developing the substrate coated with the first photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the first light-filtering pattern;
coating a second photoresist material on the substrate provided with the black matrix layer and the first light-filtering pattern, and forming at least one second light-filtering pattern through the mask by ultraviolet exposure and developing the substrate coated with the second photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the second light-filtering pattern;
and
coating a third photoresist material on the substrate provided with the black matrix layer, the first light-filtering pattern and the second light-filtering pattern, and forming at least one third light-filtering pattern through the mask by ultraviolet exposure and developing the substrate coated with the third photoresist material which has a photosensitive frequency in a transmission spectrum range of the mask corresponding to the third light-filtering pattern.

3 more elements

A method for fabricating a color filter, comprising the steps of:

providing a substrate;
forming a black matrix layer on the substrate;
using a mask to form at least one first light-filtering pattern on the substrate provided with the black matrix layer;
using the mask to form at least one second light-filtering pattern on the substrate provided with the black matrix layer and the first light-filtering pattern;
using the mask to form at least one third light-filtering pattern on the substrate provided with the black matrix layer, the first light-filtering pattern and the second light-filtering pattern, wherein the mask has different transmission spectra respectively corresponding to the first light-filtering pattern, the second light-filtering pattern and the third light-filtering pattern.

2 more elements

Dependencies are inferred from the claim text.