Method for forming a liquid film on a substrate
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorYves HENNEQUIN
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Abstract
This method for forming a liquid film on a substrate comprises the steps of placing the substrate in a chamber, and depositing a composition on the substrate, the composition including water, introducing a volatile liquid into the chamber, and closing the chamber for a predetermined period, the volatile liquid evaporating in the chamber during this closing step. The method further comprises at least partial extraction, out of the chamber, vapor formed by the evaporation of the volatile liquid, this extraction producing spreading out of the composition on the substrate, said spread composition then forming the liquid film on the substrate.
Claims20
A method for forming a liquid film on a substrate, the method comprising the following steps:
- placing the substrate in a chamber, and depositing a composition on the substrate, the composition including water,
- introducing a volatile liquid into the chamber, and
- closing the chamber for a predetermined period, the volatile liquid evaporating in the chamber during this closing step,
- wherein the method being characterized in that it further comprises the following step:
- at least partly extracting, out of the chamber, vapor formed by the evaporation of the volatile liquid, this extraction producing a spreading out of the composition on the support, said spread composition then forming the liquid film on the substrate.
The method according to claim wherein the substrate is made in a hydrophilic material.
Dependencies are inferred from the claim text.