Film thickness measurement device

A film thickness measurement device, comprising:

• a base (1);
• a substrate stage (2) which is provided on the base (1) and on which a product substrate (10) having a film is placed;
• a gantry (4) that extends in a first direction (A) with respect to the substrate stage (2) and is installed in the base (1) so as to be movable in a second direction (B) with respect to the substrate stage (2);
• a slider (5) that is installed in the gantry (4) so as to be movable in the first direction (A);
• a measurement head (23) that is fixed to the slider (5) and irradiates a film (12) of the product substrate (10) placed on the substrate stage (2) with primary X-rays to detect fluorescent X-rays generated from the film (12);
• and
• analysis means (33) that obtains thickness of the film (12) from intensity of the fluorescent X-rays detected by the measurement head (23), wherein
• the analysis means (33) includes
• substrate aluminum detection means (33a) that irradiates a substrate (11) before film formation of the product substrate (10) with the primary X-rays from the measurement head (23) and detects fluorescent X-rays generated from the substrate (11) by the measurement head (23) to detect an aluminum component contained in the substrate (11), and
• aluminum film correction means (33b) that, when an aluminum film composed of aluminum is included in the film (12) of the product substrate (10), corrects intensity of the fluorescent X-rays detected from the aluminum film by the measurement head (23) based on a detection result of the substrate aluminum detection means (33a) to obtain thickness of the aluminum film.