Staggered power structure in a power distribution network (pdn)

An substrate comprising:

• a first metal layer comprising a first set of regions, the first set of regions comprising a first netlist structure for a power distribution network (PDN) of the substrate;
• and
• a second metal layer comprising a second set of regions, the second set of regions comprising a second netlist structure of the PDN of the substrate.

A method for fabricating an integrated device, comprising:

• forming a first metal layer, wherein forming the first metal layer comprises forming a first netlist structure for a power distribution network (PDN) of the integrated device in a first set of regions of the first metal layer;
• and
• forming a second metal layer, wherein forming the second metal layer comprises forming a second netlist structure for the PDN of the integrated device in a second set of regions of the second metal layer.

A method for fabricating a substrate, comprising:

• forming a first metal layer, wherein forming the first metal layer comprises forming a first netlist structure for a power distribution network (PDN) of the substrate in a first set of regions of the first metal layer;
• and
• forming a second metal layer, wherein forming the second metal layer comprises forming a second netlist structure for the PDN of the substrate in a second set of regions of the second metal layer.