Crystalline solar cell and method for producing the latter
AssigneeSchott Solar AG
InventorsHenning NAGEL, Knut VAAS, Wilfried SCHMIDT
Life of this patent
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Abstract
A method for producing a crystalline solar cell having a p-doped silicon substrate with an n-doped region on the front side and also at least one antireflection layer is provided. The method includes uniformly applying a solution containing phosphoric acid to the entire front-side surface of the solar cell, forming phosphosilicate glass in a first thermal treatment step applied to the solar cell, and, in the first thermal treatment step or a subsequent thermal treatment step, forming silicon-containing precipitates near the surface with a homogeneous or substantially homogeneous surface coverage in a layer on the front-side surface of the substrate in the range of between 5% and 100%.
Claims23
1-23. (canceled)
A method for producing a crystalline solar cell having a p-doped silicon substrate with an n-doped region on a front side and at least one anti-reflection layer, comprising:
- forming, in the n-doped region of the substrate, precipitates containing silicon near a front-side surface with a homogeneous or largely homogeneous surface coverage in the range of between 5% and 100%,
- hydrophilizing an entirety of the front-side surface of the p-doped silicon substrate and then applying a solution containing phosphoric acid uniformly onto the entire front-side surface and,
- subsequently forming, in a first thermal treatment step of the substrate, phosphosilicate glass,
- wherein in the first thermal treatment step or in a subsequent second thermal treatment step the precipitates containing silicon are formed near the front-side surface.
A crystalline solar cell with a p-doped Si substrate comprising a front-side n-doped region having silicon-containing precipitates near a surface with a homogeneously or substantially homogeneously surface coverage in a range of 5% to 100%.
Dependencies are inferred from the claim text.