Back to results
US 2015/0311238 A1Published application
Image sensors including deposited negative fixed charge layers on photoelectric conversion regions and methods of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHYUNGJOON KIM, HYOUNGSUN PARK
Life of this patent
Estimating the term…
Abstract
A method of forming an image sensor can be provided by forming a respective photoelectric conversion region in each of a plurality of unit pixel regions of a substrate and depositing a material configured to provide a negative fixed charge layer on the photoelectric conversion region.
Claims20
An image sensor comprising:
- a substrate including a first surface, a second surface opposite to the first surface, and a plurality of unit pixel regions, wherein the second surface is configured to receive incident light;
- a photoelectric conversion region included in each of the unit pixel regions;
- and
- a negative fixed charge layer on the first surface or on the second surface,
- wherein the negative fixed charge layer includes a metal fluoride.
2 more elements
A method of manufacturing an image sensor on a substrate including a first surface and a second surface opposite to the first surface, wherein the second surface is configured to receive incident light, the method comprising:
- forming a deep device isolation layer in the substrate to define unit pixel regions;
- forming a photoelectric conversion region in each of the unit pixel regions;
- and
- forming a negative fixed charge layer adjacent to the first surface or the second surface, the negative fixed charge layer including a metal fluoride.
1 more element
A method of forming an image sensor, the method comprising:
- forming a respective photoelectric conversion region in each of a plurality of unit pixel regions of a substrate;
- and
- depositing a material configured to provide a negative fixed charge layer on the photoelectric conversion region.
Dependencies are inferred from the claim text.