Rework method of array substrate for display device and array substrate formed by the method

An array substrate for a display device, the array substrate comprising:

• a lower passivation layer, a common electrode layer, an upper passivation layer, and a jumping pixel electrode pattern sequentially formed in a thin film transistor area of the display device;
• a jumping passivation hole for electrically interconnecting the common electrode layer and a common voltage metal line of the display device;
• and
• a common electrode layer, a remnant pixel electrode pattern, and a rework pixel electrode pattern, which are sequentially formed on the lower passivation layer in an area of the jumping passivation hole.

An display device comprising:

• a common voltage metal line formed in the display device beneath a first hole area in both a lower passivation layer and an upper passivation layer;
• a common electrode layer (VCOM ITO) formed in the display device above the lower passivation layer and beneath a second hole area in the upper passivation layer;
• a remnant pixel electrode pattern connected to the common electrode layer, the remnant pixel electrode pattern formed in the second hole area;
• and
• a jumping pixel electrode pattern connecting to the remnant pixel electrode pattern and to the common voltage metal line through the first hole area.