Electrostatic chuck, placing table and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsKatsuyuki KOIZUMI, Dai KITAGAWA, Tomoyuki TAKAHASHI
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Abstract
Disclosed is an electrostatic chuck including a circular placing region configured to place a processing target object thereon. The placing region includes a bottom surface and a plurality of protrusions configured to protrude from the bottom surface. Further, the plurality of protrusions is formed at a plurality of positions set at a regular interval on each of a plurality of circles set concentrically and at a regular interval around a center of the placing region. Furthermore, among the plurality of positions, a plurality of positions set on each of any two adjacent circles is set not to be positioned on the same straight line extending from the center.
Claims8
An electrostatic chuck comprising:
- a circular placing region configured to place a processing target object thereon,
- wherein the placing region includes:
- a bottom surface;
- and
- a plurality of protrusions configured to protrude from the bottom surface,
- the plurality of protrusions is formed at a plurality of positions set at a regular interval on each of a plurality of circles set concentrically and at a regular interval around a center of the placing region, and
- among the plurality of positions, a plurality of positions set on each of any two adjacent circles is set not to be positioned on the same straight line extending from the center.
Dependencies are inferred from the claim text.