Lithography apparatus, and method of manufacturing an article
AssigneeCanon Kabushiki Kaisha
InventorHiro Norikane
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Abstract
The present invention provides a lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising a blanker configured to perform blanking of the beam, and a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate, wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose.
Claims10
A lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising:
- a blanker configured to perform blanking of the beam;
- and
- a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate,
- wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose.
A method of manufacturing an article, the method comprising steps of:
- performing patterning on a substrate using a lithography apparatus;
- and
- processing the substrate, on which the patterning has been performed, to manufacture the article,
- wherein the lithography apparatus performs patterning on the substrate with a beam, and includes:
- a blanker configured to perform blanking of the beam;
- and
- a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate,
- wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose.
Dependencies are inferred from the claim text.