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US 2015/0310157 A1Published application
Mask error compensation by optical modeling calibration
AssigneeGlobalfoundries Inc.
InventorsGuoxiang NING, Paul ACKMANN, Chin Teong LIM
Life of this patent
Estimating the term…
Abstract
Methodologies and an apparatus for enabling OPC models to account for errors in the mask are disclosed. Embodiments include: determining a patterning layer of a circuit design; estimating a penetration ratio indicating a mask corner rounding error of a fabricated mask for forming the patterning layer in a fabricated circuit; and determining, by a processor, a compensation metric for optical proximity correction of the circuit design based on the penetration ratio.
Claims20
A method comprising:
- determining a patterning layer of a circuit design;
- estimating a penetration ratio indicating a mask corner rounding error of a fabricated mask for forming the patterning layer in a fabricated circuit;
- and
- determining, by a processor, a compensation metric for optical proximity correction of the circuit design based on the penetration ratio.
1 more element
An apparatus comprising:
- a processor;
- and
- a memory including computer program code for a program, the memory and the computer program code configured to, with the processor, cause the apparatus to perform the following, determine a patterning layer of a circuit design;
- estimate a penetration ratio indicating a mask corner rounding error of a fabricated mask for forming the patterning layer in a fabricated circuit;
- and
- determine a compensation metric for optical proximity correction of the circuit design based on the penetration ratio.
3 more elements
A method comprising:
- determining a patterning layer of a circuit design;
- comparing a predefined area to an area of a hole of the patterning layer or an area of a vertical integration access feature of the patterning layer;
- determining whether to select a predefined penetration ratio designated for the circuit design or to initiate a calculation of a penetration ratio based the comparing;
- estimating a penetration ratio based on the determining of whether to select or to initiate the calculation;
- determining a correction factor based on the penetration ratio, the correction factor indicating a mask corner rounding difference between a mask design for forming the patterning layer and a fabricated mask design of the mask design;
- and
- generating, by a processor, a compensation metric for optical proximity correction of the circuit design based on the correction factor.
4 more elements
Dependencies are inferred from the claim text.