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AssigneeInternational Business Machines Corporation
InventorsLUISA D. BOZANO, DARIO L. GOLDFARB, LINDA K. SUNDBERG, HOA D. TRUONG, HSINYU TSAI, GREGORY M. WALRAFF
Estimating the term…
A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.
A process of producing negative-tone photoresist patterns using a photoresist developed with an organic solvent developer comprising the steps of:
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The process of claim 9 wherein said quaternary ammonium compound comprises one of TMAH, TEAH, BTMAH, BTEAH, TBAH, HDTMAH, and combinations thereof.
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A process of producing a negative-tone photoresist pattern using a photoresist developed with an organic solvent developer comprising the steps of:
23-24. (canceled)
The process of claim 24 comprising about 0.12 mol/dm3 to about 0.19 mol/dm3 of said basic compound and said solvent developer comprises a combination of 2 solvents in a solvent blend mass ratio of about 1:10 to about 1:1.
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A photoresist article of manufacture comprising a photoresist polymer having photo generated acidic sites reacted with a basic compound comprising at least one of ammonia, hydroxyl amine, an organic amine, or a metal based compound and combinations thereof.
A composition of matter comprising a photoresist polymer selected from a polymer having an aromatic ring substituted with a group comprising an oxy group, or PBOCST, or a phenolic resin, or a ketal protected poly(hydroxystyrene) positive-tone photoresist polymer, and an organic solvent selected from Methyl benzoate, Ethyl 3-ethoxypropionate, 2-Heptanone, 4-Methyl-2-pentanone, N-Butyl acetate, Anisole, Acetophenone and combinations thereof admixed with a basic compound comprising a Bronsted base.
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The process of claim 24 wherein said photoresist polymer comprises a polymer having an aromatic ring substituted with a group comprising an oxy group.
The process of claim 24 wherein said photoresist polymer comprises PBOCST.
The process of claim 24 wherein said photoresist polymer comprises a ketal protected poly(hydroxystyrene) positive-tone photoresist polymer.
The process of claim 24 wherein said photoresist polymer comprises a phenolic polymer.
Dependencies are inferred from the claim text.