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US 2015/0309408 A1Published application
Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film
AssigneeFUJIFILM Corporation
InventorsTomotaka TSUCHIMURA, Tadateru YATSUO
Life of this patent
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Abstract
A negative resist composition includes an onium salt compound (A) containing a nitrogen atom in its cation moiety, a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (C) containing an acid-crosslinkable group.
Claims19
A negative resist composition comprising:
- an onium salt compound (A) containing a nitrogen atom in its cation moiety,
- a compound (B) that is configured to produce an acid when exposed to actinic rays or radiation, and
- a compound (C) containing an acid-crosslinkable group.
Dependencies are inferred from the claim text.