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US 2015/0309402 A1Published application
Target element types for process parameter metrology
AssigneeKLA-Tencor Corporation
InventorsVladimir LEVINSKI, Feler YOEL, Daniel KANDEL
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Abstract
Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.
Claims19
A metrology target, comprising:
- a plurality of target elements belonging to at least two target element types, wherein each of the target element types comprises unresolved features which offset at least one specified production parameter to a specified extent.
A method, comprising:
- designing a metrology target using a plurality of target elements belonging to at least two target element types, wherein each of the target element types comprises unresolved features which offset at least one specified production parameter to a specified extent.
Dependencies are inferred from the claim text.