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US 2015/0309214 A1Published application
Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element
AssigneeFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
InventorsUlrike Schulz, Friedrich Rickelt, Peter Munzert, Norbert Kaiser
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Abstract
A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.
Claims16
A method for producing an antireflection layer, the method comprising:
- forming an organic layer over a silicone surface;
- forming a reflection-reducing nanostructure in the organic layer using a plasma etching process;
- and
- forming a cover layer over the nanostructure.
1 more element
An optical element comprising:
- a substrate having a silicone surface;
- an antireflection layer overlying the silicone surface,
- the antireflection layer comprising an organic layer that comprises a reflection-reducing nanostructure, the nanostructure having a depth of at least 30 nm;
- and
- a cover layer overlying the organic layer, the cover layer having a thickness of no more than 40 nm.
2 more elements
Dependencies are inferred from the claim text.