Integrated reference vacuum pressure sensor with atomic layer deposition coated input port
AssigneeHoneywell International Inc.
InventorGregory C. Brown
Life of this patent
Estimating the term…
Loading patent…
AssigneeHoneywell International Inc.
InventorGregory C. Brown
Estimating the term…
An integrated reference vacuum pressure sensor with an atomic layer deposition (ALD) coated input port comprises a housing with an port for a media to enter the housing; a substrate and stress isolation member in the housing; wherein a channel extends through the substrate and the stress isolation member, wherein a trace is embedded within the stress isolation member, wherein stress isolation member and substrate surfaces exposed to the channel are coated with an ALD; a sensor die bonded to the stress isolation member, the sensor die comprising a diaphragm having circuitry, wherein a side of the diaphragm is exposed to the channel and the circuitry is mounted to another side of the diaphragm; a via extending through the sensing die electrically connecting the circuitry to the trace; and a cover bonded to the stress isolation member, the cover having a recess, the sensor die in the recess.
A method for fabricating a pressure sensor, the method comprising:
Dependencies are inferred from the claim text.