Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
AssigneeHitachi Kokusai Electric Inc.
InventorsShuhei SAIDO, Yuichi WADA, Takafumi SASAKI
Life of this patent
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Abstract
A substrate processing apparatus includes: a substrate mounting table on which a substrate is mounted; an inert gas supply part configured to supply an inert gas on a surface of the substrate from an upper side of the substrate mounting table at a lateral side of the processing gas supply part; and a plurality of gas exhaust parts configured to exhaust a gas supplied on the surface of the substrate to an upper side, between the processing gas supply part and the inert gas supply part.
Claims15
A substrate processing apparatus, comprising:
- a substrate mounting table on which a substrate is mounted;
- a processing gas supply part configured to supply a processing gas on a surface of the substrate from an upper side of the substrate mounting table;
- an inert gas supply part configured to supply an inert gas on a surface of the substrate from an upper side of the substrate mounting table at a lateral side of the processing gas supply part;
- and
- a plurality of gas exhaust parts configured to exhaust the gas supplied on the surface of the substrate to an upper side, between the processing gas supply part and the inert gas supply part.
A method for manufacturing a semiconductor device, comprising:
- supplying a processing gas on a surface of a substrate mounted on a substrate mounting table from a processing gas supply part positioned at an upper side of the substrate mounting table;
- supplying an inert gas on the surface of the substrate from an inert gas supply part disposed at a lateral side of the processing gas supply part and positioned at the upper side of the substrate mounting table;
- exhausting a processing gas supplied on the surface of the substrate to the upper side of the substrate by at least a part of the plurality of gas exhaust parts disposed between the processing gas supply part and the inert gas supply part;
- and
- exhausting an inert gas supplied on the surface of the substrate by at least other part of the plurality of gas exhaust parts.
A non-transitory computer readable recording medium storing a program for causing a computer to execute in parallel:
- a processing gas supply procedure of supplying a processing gas on a surface of a substrate mounted on a substrate mounting table from a processing gas supply part positioned at an upper side of the substrate mounting table;
- an inert gas supply procedure of supplying an inert gas on the surface of the substrate from an inert gas supply part disposed at a lateral side of the processing gas supply part and positioned at the upper side of the substrate mounting table;
- a processing gas exhaust procedure of exhausting a processing gas supplied on the surface of the substrate to the upper side of the substrate by at least a part of the plurality of gas exhaust parts disposed between the processing gas supply part and the inert gas supply part;
- and
- an inert gas exhaust procedure of exhausting an inert gas supplied on the surface of the substrate by at least other part of the plurality of gas exhaust parts.
Dependencies are inferred from the claim text.