Drum sputtering device
AssigneeHitachi Chemical Company, Ltd.
InventorsShunsuke Ueda, Eisuke Haba
Life of this patent
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Abstract
A drum sputtering device that can uniformly deposit target atoms on all over particles is provided. The drum sputtering device includes a vacuum container 2 that contains particles, a tubular drum 10 that is arranged inside the vacuum container 2 and at least one end face 10c of which is open, and a sputtering target 16 that is arranged inside the drum 10. With a supporting arm 11, a drive motor 12 for rotation, a drive motor 13 for swing, a first gear member 14, and a second gear member 15, the drum can be rotated around the axis of the drum 10 and the drum 10 can be swung so that one end portion 10e and the other end portion 10f in the axial direction of the drum 10 are relatively vertically switched.
Claims5
A drum sputtering device comprising:
- a vacuum container that contains particles;
- a tubular drum that is arranged inside the vacuum container and at least one end face of which is open;
- a sputtering target that is arranged inside the drum;
- a rotation mechanism that rotates the drum around an axis of the drum;
- and
- a swing mechanism that swings the drum so that one end portion and the other end portion in an axial direction of the drum are relatively vertically switched.
Dependencies are inferred from the claim text.