Nanostructure and method of manufacturing the same
AssigneeDexerials Corporation
InventorSohmei ENDOH
Life of this patent
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Abstract
A nanostructure that is visually recognized as being seamless by its more regularly and more uniformly formed fine concave-convex structure and that exhibits an excellent antireflection effect against light in a visible wavelength range is provided. Such a nanostructure is configured by a number of rows of tracks each including structures, formed by protrusions or depressions on a surface of a substrate, arranged at a predetermined fine pitch. In this nanostructure, a distance between centers of the structures adjacent to each other across a strip-shaped portion (seam) in which portions with no structures within the predetermined pitch are continuously formed in a track arrangement direction is adjusted so as to prevent visual recognition of the seam.
Claims9
A nanostructure comprising a number of rows of tracks, each including arrangement of structures formed by protrusions or depressions on a surface of a substrate with a predetermined pitch, wherein
- a distance between centers of the structures adjacent to each other across a strip-shaped portion (hereinafter referred to as a seam) in which portions with no structures within the predetermined pitch are continuously formed in a track arrangement direction or a length of the seam is determined so as to prevent visual recognition of the seam.
Dependencies are inferred from the claim text.