Method for fabricating ultra-low density three-dimensional thin film structure based on photo-lithography

A method for forming an ultra-low density three-dimensional thin film structure made of a solid thin film, the method comprising the steps of:

• radiating ultraviolet rays of different patterns in respective predetermined directions to a liquid photosensitive resin bulk so as to harden a portion of the resin bulk;
• removing the liquid photosensitive resin which is not hardened so as to form a solid photosensitive resin structure;
• coating the surface of the solid photosensitive resin structure with a thin film;
• removing the thin film from an outermost surface of the resin bulk so as to expose the solid photosensitive resin;
• and
• removing the solid photosensitive resin structure, wherein
• each of the different patterns has a structure in which predetermined polygonal shapes are arranged in the vicinity of and alternately with each other,
• the solid photosensitive resin structure has a structure in which a plurality of prisms intersects with each other,
• the ultra-low density three-dimensional thin film structure made of a solid thin film has a structure in which hollow polyhedron unit cells having surfaces with a flat surface element are interconnected and repeatedly formed, thus enabling the ultra-low density three-dimensional thin film structure to be formed into an engraved structure relative to the solid photosensitive resin structure.