Nozzle and method of making same
AssigneeASML Netherlands B.V.
InventorsJIAN ZHAO, TETSUYA ISHIKAWA
Life of this patent
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Abstract
An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository including a nozzle with a radial trench design. The nozzle may be formed from a silicon-on-insulator wafer.
Claims19
A nozzle comprising an orifice through a substrate and a structure defining a plurality of trenches positioned around the orifice, formed on the substrate, and extending generally radially with respect to a central portion of the orifice.
A nozzle comprising:
- an inlet;
- and
- an outlet in fluid communication with the inlet, the outlet being formed of an orifice and a plurality of trenches circumferentially spaced around the orifice and formed on a common substrate and extending radially with respect to a central portion of the orifice.
A multilayer nozzle structure comprising:
- a first layer comprising structure formed from the first layer defining an inlet;
- and
- a second layer on the first layer, the second layer comprising structure formed from the second layer defining a nozzle orifice aligned with the inlet, the nozzle orifice being in the form of a plurality trenches extending radially with respect to a central portion of the nozzle orifice.
A multilayer nozzle structure formed of an SOI substrate, the SOT substrate comprising a device layer, an insulating layer, and a handle layer, the nozzle comprising:
- an inlet formed in the handle layer;
- and
- a nozzle orifice formed in the device layer and aligned with the inlet, the nozzle orifice being in the form of a plurality trenches extending radially with respect to a central portion of the nozzle orifice.
A method of making a nozzle in an SOI substrate have a device layer, an insulating layer, and a handle layer, the method comprising:
- etching an orifice hole through the device layer and buried oxide layer;
- etching in the device layer a trench pattern around the orifice hole;
- and
- etching in the handle layer an inlet aligned with and in fluid communication with the orifice hole.
Dependencies are inferred from the claim text.