Method for generating extreme ultraviolet light and device for generating extreme ultraviolet light

An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by turning a target into plasma by irradiating the target with a pulse laser beam, comprising:

• a chamber provided with a through-hole;
• an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole;
• a target supply device configured to output the target toward the first predetermined region;
• and
• a target sensor configured to detect the target passing through a second predetermined region by irradiating the second predetermined region with light and by detecting light incident on the target sensor from the second predetermined region, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region, and the second predetermined region being a region that is longer along a direction perpendicular to a direction of movement of the target and perpendicular to an optical path of the light with which the second predetermined region is irradiated than along the direction of movement of the target.

An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by turning a target into plasma by irradiating the target with a pulse laser beam, comprising:

• a chamber provided with a through-hole;
• an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole;
• a target supply device configured to output the target toward the first predetermined region;
• a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region;
• and
• an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.

An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by turning a target into plasma by irradiating the target with a pulse laser beam, comprising:

• a chamber provided with a through-hole;
• an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole;
• a target supply device configured to output the target toward the first predetermined region;
• a light source configured to irradiate a second predetermined region with light, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region;
• a transfer optical system configured to form an image of the target passing through the second predetermined region;
• and
• an optical sensor being disposed at a position where the image of the target is formed by the transfer optical system, an optical sensor being configured to detect light incident on a third predetermined region from the transfer optical system to detect the target passing through the second predetermined region, the third predetermined region being longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target.