# US 2015/0178431 A1 · Mask pattern generation method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2015/0178431 A1 - Document ID: US20150178431A1 - Status: Published application - Kind: A1 - Application number: 14/579,667 - Filed: 2014-12-22 - Published: 2015-06-25 - Earliest claimed: 2013-12-25 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: Tadashi Arai - Web page: https://patentgrep.com/patent/US20150178431A1 ## CPC - G03F 7/30: Imagewise removal using liquid means - G03F 1/00: Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof - G03F 1/36: Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A method for generating a pattern of a mask includes obtaining data of a plurality of polygons representing a plurality of pattern elements, grouping polygons which overlap or contact with each other among the plural polygons in one group, not setting an evaluation position for evaluating an image of a pattern of the one group on a line segment of sides which overlap or contact with each other among sides of the polygon of the one group, and setting an evaluation position at a portion except for the line segment, and repeating calculating the image of the pattern of the one group, evaluating the calculated image at the set evaluation position, and correcting the pattern based on a result of the evaluating, and generating the pattern of the mask based on a result of the repeating step. ## Claims ### Claim 1 A method for generating a pattern of a mask used for exposing a substrate, the method comprising the following steps performed by a processor, obtaining data of a plurality of polygons representing a plurality of pattern elements, grouping polygons which overlap or contact with each other among the plural polygons in one group, not setting an evaluation position for evaluating an image of a pattern of the one group on a line segment of sides which overlap or contact with each other among sides of the polygon of the one group, and setting an evaluation position at a portion except for the line segment, repeating calculating the image of the pattern of the one group, evaluating the calculated image at the set evaluation position, and correcting the pattern based on a result of the evaluating, and generating the pattern of the mask based on a result of the repeating. ### Claim 2 (depends on 1) The method according to claim 1, wherein the evaluation position is a position for evaluating the image in a direction different from a direction of sides which overlap or contact with each other among sides of the polygon of the one group. ### Claim 3 (depends on 2) The method according to claim 2, wherein the evaluation position is a position for evaluating the image in a direction perpendicular to a direction of sides which overlap or contact with each other among sides of the polygon of the one group. ### Claim 4 (depends on 1) The method according to claim 1, wherein, the setting includes setting the evaluation position using a center position and width of the polygon. ### Claim 5 (depends on 1) The method according to claim 1, wherein the setting includes dividing into a plurality of cells so that respective polygons are arranged in respective cells using data of the obtained plurality of polygons, generating map data which has information representing existence or non-existence of the pattern element on each cell, and setting continued cells having information of polygons into one group using the map data. ### Claim 6 (depends on 1) The method according to claim 1, further comprising: fixing positions of sides which overlap or contact with each other among sides of the polygon of the one group, and setting a position of a side except for the overlapping or contacting sides changeable, wherein, in the repeating, the calculating, the evaluating, and changing a position of a side except for the overlapping or contacting sides based on the result of the evaluating is repeated. ### Claim 7 (depends on 1) The method according to claim 1, wherein evaluating the calculated image at the set evaluation position is performed by obtaining a dimension or a position shift of the image from points at an intersection of a contour of the calculated image with a line connecting the evaluation positions. ### Claim 8 (depends on 6) The method according to claim 6, further comprising: setting a center position and width of the polygon as parameters, wherein, in the changing, a position of a side except for the overlapping or contacting sides is changed by changing values of the parameters. ### Claim 9 (depends on 1) The method according to claim 1, wherein the plurality of pattern elements includes rectangular pattern element for cutting or connecting a line and space pattern. ### Claim 10 (depends on 1) A non-transitory recording medium recording a program that causes a computer to execute the generation method according to claim 1. ### Claim 11 (depends on 1) An information apparatus that performs the method for generating a pattern of a mask according to claim 1. ### Claim 12 (depends on 1) A mask manufacturing method comprising: generating data on a pattern of a mask by the method according to claim 1; and manufacturing the mask using the generated data on the mask pattern. ### Claim 13 (depends on 12) An exposure method comprising: manufacturing a mask by the method according to claim 12; and exposing a substrate by projecting an image of a pattern of the manufactured mask onto the substrate. ### Claim 14 (depends on 13) A method of manufacturing a device, the method comprising: exposing a substrate by using an exposure method according to claim 13; and developing the exposed substrate. ### Claim 15 (depends on 10) The non-transitory recording medium according to claim 10, wherein the evaluation position is a position for evaluating the image in a direction different from a direction of sides which overlap or contact with each other among sides of the polygon of the one group. ### Claim 16 (depends on 15) The non-transitory recording medium according to claim 15, wherein the evaluation position is a position for evaluating the image in a direction perpendicular to a direction of sides which overlap or contact with each other among sides of the polygon of the one group. ### Claim 17 (depends on 10) The non-transitory recording medium according to claim 10, wherein, the setting includes setting the evaluation position using a center position and width of the polygon. ### Claim 18 (depends on 10) The non-transitory recording medium according to claim 10, wherein the setting includes dividing into a plurality of cells so that respective polygons are arranged in respective cells using data of the obtained plurality of polygons, generating map data which has information representing existence or non-existence of the pattern element on each cell, and setting continued cells having information of polygons into one group using the map data. ### Claim 19 (depends on 10) The non-transitory recording medium according to claim 10, further comprising: fixing positions of sides which overlap or contact with each other among sides of the polygon of the one group, and setting a position of a side except for the overlapping or contacting sides changeable, wherein, in the repeating, the calculating, the evaluating, and changing a position of a side except for the overlapping or contacting sides based on the result of the evaluating is repeated. ### Claim 20 (depends on 10) The non-transitory recording medium according to claim 10, wherein evaluating the calculated image at the set evaluation position is performed by obtaining a dimension or a position shift of the image from points at an intersection of a contour of the calculated image with a line connecting the evaluation positions.